Technology

Symposium R

Next-Generation Nanoimprint Lithography: Products and Applications

Symposium Scope

This symposium on advances in nanoimprint lithography (NIL) is focused on imprint-enabled nanomanufacturing processes, technologies and products, and is structured to accommodate both academia and industry players. The NIL market has gained significant traction in both semiconductor and non-semiconductor domains such as optics, photonics, advanced flat panel display, sensors, flexible electronics and MedTech. This symposium brings together eminent scientists, engineers and industry partners from all around the globe to share and discuss the nanoimprint ecosystem in their respective place of operation and recent advancement in this multi-disciplinary field. It will also cover imprint materials development, process development, device integration, defect inspection and new product introduction.

Topics

  • Advanced nanoimprint processes and products;
  • Novel resists and imprint materials development;
  • Nanoimprint-enabled diffractive and refractive optics;
  • Next-generation sensors-, photonics- and MedTech- devices.;
  • Nanoimprint for flexible electronics, hybrid electronics, wearables;
  • Industry roadmap and technology gaps in the nanoimprint platform.

List of Speakers

~ Speakers’ list forthcoming ~

Chair

Vignesh Suresh
Institute of Materials Research & Engineering, A*STAR, Singapore

Co-Chair(s)

Jay Guo
University of Michigan, USA

Fei Duan
Nanyang Technological University, Singapore

Correspondence

Vignesh Suresh
Institute of Materials Research & Engineering, A*STAR, Singapore
Email: sureshv@imre.a-star.edu.sg

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